High Purity Water System

Today’s increasingly sophisticated processing technologies demand the same level of sophistication in designing and building equipment for treatment of water. Requirements can be as simple as a water softener, filter or a chemical additive device or as complex as an ultrapure water (UPW) system serving the semiconductor, electronics and pharmaceutical manufacturing processes. PACT ’s engineering staff will recommend, design and build the equipment required to produce the water purities demanded by said industries.


The objectives of A UPW system design is to remove suspended solids (particulates), dissolved solids (salts), organic compounds (TOC), Bacteria, spores and mold and to minimize introduction of contaminants from materials of construction.

High Purity water, typically demanded in the SEMICONDUCTOR industry:

Resistivity >18.2 megohm/cm TOC <5.0 ppb
Total Bacteria >2/100 ml Dissolved Silica (SiO2 ) >0.5 ppb
Aluminum (Al) >0.1 ppb Ammonia (NH 4 ) >0.05 ppb
Chromium (Cr) >0.05 ppb Iron (Fe) >0.1 ppb
Manganese (Mn) >0.1 ppb Potassium (K) >0.05 ppb
Sodium (Na) >0.05 ppb Bromide (Br) >0.05 ppb
Chloride (Cl) >0.05 ppb Nitrate (NO 3 ) >0.05 ppb
Phosphate (PO4 ) >0.1 ppb Sulfate (SO 4 ) >0.1 ppb
Total Dissolved Solids 5 ppb

A UPW system utilizes a range of equipment designed, manufactured and/or supplied by PACT and that can be summarized as follows:

Pressure Sand & Multimedia Filters

Activated Carbon Filters

Ion-Exchange Softeners

Two-Bed Deionizers

Mixed-Bed Deionizers

Reverse Osmosis Systems

Vacuum Degasifers

Electro-Deionization units


Ultraviolet Disinfection


Chemical Metering Packages

Instrumentation & Control

Special Piping, Fittings and Linings