High Purity Water System
Today’s increasingly sophisticated processing technologies demand the same level of sophistication in designing and building equipment for treatment of water. Requirements can be as simple as a water softener, filter or a chemical additive device or as complex as an ultrapure water (UPW) system serving the semiconductor, electronics and pharmaceutical manufacturing processes. PACT ’s engineering staff will recommend, design and build the equipment required to produce the water purities demanded by said industries.
The objectives of A UPW system design is to remove suspended solids (particulates), dissolved solids (salts), organic compounds (TOC), Bacteria, spores and mold and to minimize introduction of contaminants from materials of construction.
High Purity water, typically demanded in the SEMICONDUCTOR industry:
| Resistivity | >18.2 megohm/cm | TOC | <5.0 ppb |
| Total Bacteria | >2/100 ml | Dissolved Silica (SiO2 ) | >0.5 ppb |
| Aluminum (Al) | >0.1 ppb | Ammonia (NH 4 ) | >0.05 ppb |
| Chromium (Cr) | >0.05 ppb | Iron (Fe) | >0.1 ppb |
| Manganese (Mn) | >0.1 ppb | Potassium (K) | >0.05 ppb |
| Sodium (Na) | >0.05 ppb | Bromide (Br) | >0.05 ppb |
| Chloride (Cl) | >0.05 ppb | Nitrate (NO 3 ) | >0.05 ppb |
| Phosphate (PO4 ) | >0.1 ppb | Sulfate (SO 4 ) | >0.1 ppb |
| Total Dissolved Solids | 5 ppb | ||
A UPW system utilizes a range of equipment designed, manufactured and/or supplied by PACT and that can be summarized as follows:
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Pressure Sand & Multimedia Filters |
Activated Carbon Filters |
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Ion-Exchange Softeners |
Two-Bed Deionizers |
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Mixed-Bed Deionizers |
Reverse Osmosis Systems |
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Vacuum Degasifers |
Electro-Deionization units |
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Microfiltration |
Ultraviolet Disinfection |
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Ozonation |
Chemical Metering Packages |
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Instrumentation & Control |
Special Piping, Fittings and Linings |
